26 Publications

“Design strategy for Low e windows with  effective insulation”; Proceedings Volume 8981-53: Photonics West  March 2014

"Wire grid polarizers fabricated by low angle deposition",  Proceedings Volume 8613: Advanced Fabrication Technologies for Micro/Nano Optics and
Photonics VI March 2013 •

"Advances in roll to roll processing”, Photonics West 2008

“Strategies for low cost imprint molds”,  SPIE Optics,  2008

“Advances in the Fabrication of Surface Modified Micro-fluidic Devices in Non - Fluorescing UV Cured Materials”, MicroTas 2007 http://www.impattern.

Fabrication of Nanometer Sized Features on Non-Flat Substrates Using a Nano-Imprint Lithography Process  Mike Miller, Gary Doyle, Nick Stacey,
Frank Xu, S.V. Sreenivasan, Mike Watts, Dwayne LaBrake. SPIE Microlithography Conference, February 2005.

Development of Imprint Materials for the Step and Flash Imprint Lithography Process
Frank Xu, Nick Stacey, Mike Watts, Van Truskett, Ian McMackin, Jin Choi, Philip Schumaker, Ecron Thompson, Daniel Babbs, S.V. Sreenivasan,
Grant Willson, Norm Schumaker. SPIE Microlithography Conference, February 2004

Step and Flash Imprint Lithography for sub-80nm Contact Holes  
D. Mancini, D. Resnick, S.V. Sreenivasan, M. Watts. Solid State Technology, February 2004.

Design and Performance of a Step and Repeat Imprinting Machine
Ian McMackin, Philip Schumaker, Daniel Babbs, Jin Choi, Wenli Collison, S.V. Sreenivasan, Norman Schumaker, Michael Watts, Ronald Voisin. SPIE
Microlithography Conference, February 2003.

“Opportunities and Solutions in Patterning LED's”,  Photonics West 2007
“A Novel Method For The Prediction Of Process Sensitivity In Photolithography,” Proc SPIE Microlithography, 1988

“Study Of The Reaction Kinetics Of The Photoresist Aging Process,” Proc SPIE Microlithography, 1988

“Photoresist As Its Own Process Monitor,” Solid State Technology, 1988

“The Reduction Of Reflective Notches Using Dyed Photoresist,” Poly. Eng. & Sci., v26, p1185, 1986

“Analytical model of positive photoresist applied to line width control,” J.Vac.Sci.Technol., p434, 1985

“A New Response Surface Analysis Procedure For Evaluating Process Control In Photolithography,” Proc SPIE Microlithography, 1984

“Electron Beam Resist Systems - A Critical Review Of Recent Developments,” Solid State Tech, p59, 1984

“Optical Positive Resist Processing - Exptl And Analytical Model,” Proc SPIE Microlithography, 1983

“A High Sensitivity Two Layer Resist Process For Use In High Resolution Optical Lithography,” Proc SPIE Microlithography, 1983

“New Methods Of Production Of Highly Oriented Polymers By Solid State Extrusion,” Solid State Extrusion 297, 1983

“A Two Layer Photoresist Process In A Production Environment,” Proc SPIE Microlithography, 1982

“Push Pull Extrusion: A New Approach For Solid State Deformation,” J.App.Poly.Sci., V26, p1309, 1981

“Solid State Extrusion Of Ultra High Molecular Weight Polyethylene,” Poly.Eng.&Sci.,V20, p555, 1980

“Shrinkage As A Measure Of Deformation Efficiency Of Ultra Oriented Polyethylene,” J.Mat.Sci, p426, 1980

“Solubility Ratio, Sensitivity, And Line Width Control In Positive E-Beam Resists,” Proc. 9th Electron and Ion Beam Conf., p378, 1980

“Solid State Extrusion Of Polymer Powders Illustrated With UHMWPE,” J.Poly.Sci.Letters, V17, p485, 1979

“Phase Separation And Mechanical Properties Of An Amorphous Poly(Ether-B-Ester),” Multiphase Polymers, A.C.S. V 176, p153, 1978
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